China's Quiet Advance in Chipmaking Technology Results in EUV Lithography Machine Breakthrough
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【路透社：中國成功製造極紫外線光刻機原型】China Reportedly Builds A Prototype EUV Machine By Ex-ASML Employees. 據路透社引述知情人士稱，中國深圳的一間實驗室已在2025年年初，成功建造出了一台極紫外線光刻機的原型，目前正在測試其性能。消息人士透露，該原型機體積龐大，已成功分離出了極紫外線，但暫未通過機器生產出可用的芯片，而目標是在2028年至2030年投產。設計建造的團隊，曾經就職於荷蘭半導體設備製造商阿斯麥公司。#極紫外線 #光刻機 #ASML EUV #阿斯麥 #深圳 #Shenzhen | Phoenix TV 鳳凰衛視
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