IEEE

Efficient Erase Operation by GIDL Current for 3D Structure FeFETs With Gate Stack Engineering and Compact Long-Term Retention Model

Abstract: We have fabricated junctionless N-type silicon-on-insulator (SOI) ferroelectric-HfO 2 field effect transistors (FeFETs) with overlap and underlap structures between gate and drain/source ...
IEEE

Retention Characteristics Dependent on High-κ Gate-Insulator Stack in Hf-ZnO Synaptic Thin-Film Transistors

Abstract: In this paper, we present a study on a retention characteristics dependent on a high-$\kappa $ gate insulator stack in synaptic thin-film transistors (Syn-TFTs) with a Hf-ZnO channel layer.
Food Standards Agency

Danone recalls several Aptamil and Cow & Gate First Infant Milk and Follow on Milk formula products because of the possible presence of cereulide (toxin)

Best before All dates up to and including 17 January 2027 ...